AndTech to Host Web Seminar on Nanoimprint Microstructure Formation Technology and Optical Device Applications on Friday, June 19

AndTech Co., Ltd. (Headquarters: Kawasaki City, Kanagawa Prefecture; President and CEO: Masao Suyama; hereinafter referred to as AndTech) will offer a course on "Nanoimprinting" and its "Application to Optical Components."

This seminar will explain the latest technological trends, from nanoimprint equipment and process technology to applications in optoelectronic integration packages.

Nanoimprint technology is gaining attention as a technique for forming optical microstructures such as lenses, polarizers, and light control components. In recent years, advancements have been made in large-area processing through Roll-to-Roll methods and the development of highly durable optical elements using glass nanoimprinting.

Focusing on microstructure formation technology, the course will cover its applications in optical devices.

Overview of the Live Stream/Web Seminar ──────────────────

Theme: Microstructure Formation Technology by Nanoimprinting and Applications to Optical Devices - Wafer Level Lenses, Polarizers, Glass Nanoimprints, and Optoelectronic Integration

Date and Time: Friday, June 19, 2026, 13:00-17:35

Participation Fee: 55,000 JPY (tax included) *Materials are planned to be distributed electronically.

URL: https://andtech.co.jp/seminars/1f14d188-6c0b-67e4-92d7-064fb9a95405

Web Delivery Format: Zoom (URL will be sent after registration)

Seminar Content Structure ────────────

Lecture 1: 13:00-15:00 (Shibaura Machine Co., Ltd.: Mr. Kokubo) "Design of Nanoimprint Equipment and Application Examples to Optical Materials"

Lecture 2: 15:10-16:25 (National Institute of Advanced Industrial Science and Technology [AIST]: Mr. Hokari) "Research and Development of Optical Components Using Nanoimprinting"

Lecture 3: 16:35-17:35 (Nippon Sheet Glass Co., Ltd.: Mr. Iki) "Processing Technology Using Sol-Gel Glass and Glass Nanoimprinting"

Knowledge to be Gained and Technical Challenges Addressed in This Seminar ───────────────────────

1. Basic principles and characteristics of nanoimprint technology 2. Design and evaluation of nanoimprint equipment 3. Application examples for polarizers and light-control blinds 4. Processing technology using sol-gel glass and glass nanoimprinting

Seminar Format ─────────────

This will be a live streaming seminar utilizing the web conferencing tool "Zoom." Details will be provided upon registration.

Full Program Details (For those interested in the specifics) ──────────────────────────────

∽∽───────────────────────∽∽ Part 1: Design of Nanoimprint Equipment and Application Examples to Optical Materials ∽∽───────────────────────∽∽

Shibaura Machine Co., Ltd. Managing Executive Officer, General Manager of R&D Center: Mitsunori Kokubo

[Presentation Summary] We will introduce presentation examples applied to actual devices, such as increasing the brightness of LEDs, manufacturing wafer-level lenses, and producing large-area (G2 (370x470mm)) Wire Grid Polarizers.

[Program] 1. Introduction to Shibaura Machine Co., Ltd. 2. Nanoimprint Process 2.1 Overview and characteristics of the nanoimprint process 2.2 Examples of devices using the nanoimprint process 2.3 Nanoimprint equipment configuration and characteristics 3. Introduction to Nanoimprint Equipment and Transfer Examples 3.1 Direct-press type nanoimprint equipment ST series 3.2 Roll-to-Roll type UV nanoimprint equipment RT series 4. Introduction of Device Application Examples Using Nanoimprint Methods 4.1 LEDs 4.1.1 Process explanation 4.1.2 Film mold production using Roll-to-Roll UV nanoimprint equipment RT series 4.1.3 Dedicated nanoimprint equipment for high-brightness LEDs ST50S-LED 4.2 WLL (Wafer Level Lens) 4.2.1 Process explanation 4.2.2 Micro lens array mold production using machining and Step & Repeat nanoimprinting 4.2.3 Dedicated nanoimprint equipment for WLL ST01S-WL 4.3 Wire Grid Polarizers (Large Area Transfer) 4.3.1 Process explanation 4.3.2 Production of large-area (G2 (370x470mm)) size WGP by inkjet resist coating (Challenge to achieve Residual Layer Thickness (RLT) target of 50nm or less) 4.3.3 Roll for G2 (370x470mm) size WGP transfer