Announcement of Exhibition at Photomask Japan 2026 Technical Exhibition (32nd Photomask Technology Exhibition)

NuFlare Technology Inc. (NFT) will exhibit at the "Photomask Japan 2026 Technical Exhibition, the 32nd Photomask Technology Exhibition," to be held on April 9th and 10th at Pacifico Yokohama Annex Hall (Yokohama, Kanagawa Prefecture).

This exhibition is held in conjunction with the "Photomask Japan 2026" international symposium on photomask and next-generation lithography mask technologies.

At this exhibition, NFT will introduce the "MBM™-4000," a multi-electron beam mask drawing system that supports mass production of semiconductor manufacturing masks for the A14 node, the "NPI-8000 series," a mask inspection system that achieves high-speed inspection (under 60 minutes) for semiconductor manufacturing masks for 10/7nm to mature nodes through simultaneous transmission and reflection inspection, and the roadmaps for each product.

NFT possesses both the electron beam technology that forms the basis of electron beam mask drawing systems and the optical technology that forms the basis of mask inspection systems. Moving forward, we will continue to drive cutting-edge technology development by leveraging our technological synergy.

Exhibition Period April 9 (Thu) 10:00–17:00, April 10 (Fri) 10:00–16:00 Venue Pacifico Yokohama Annex Hall Booth No. 31 Panel Exhibition 1. Multi-electron beam mask drawing system: MBM™-4000 2. Mask inspection system: NPI-8000 series (NPI-8000, 8000ML, 8000W) 3. Product Roadmaps

Related Site Photomask Japan 2026 | Technical Exhibition (Japanese)

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