NuFlare Technology (NFT) announced that its multi-electron beam mask writer, 'MBM™-4000,' has received the Excellence Award at the 32nd 'Semiconductor of the Year 2026' in the Semiconductor Manufacturing Equipment category. This award, presented by the Sangyo Times (Electronic Device Industry News), honors products that have contributed to the development of the latest electronics.

The award-winning 'MBM™-4000' is a multi-electron beam mask writer developed by NFT for the mass production of photomasks used in semiconductor manufacturing, supporting A14 design rules. It controls 500,000 electron beams at high speed and high precision, achieving a positional accuracy of 1.1nm (3σ) and a dimensional accuracy of 0.5nm (3σ) in photomask writing. Sales of the system began in 2025.

* A14 design rule: Design rules for semiconductor circuit patterns corresponding to the 1.4nm generation.

NFT previously won the Grand Prix in the Semiconductor Manufacturing Equipment category at 'Semiconductor of the Year 2023' for its multi-electron beam mask writer, 'MBM™-2000PLUS,' making this its first win in three years.

NFT remains committed to creating new value through semiconductor manufacturing equipment and contributing to the semiconductor industry, humanity, and society.

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  • Source: PR TIMES
  • Category: New Product